kw.\*:("SPECTROMETRIE SIMS")
Results 1 to 25 of 4549
Selection :
HYDROGEN PROFILES OF ANODIC ALUMINUM OXIDE FILMS = PROFILS D'H2 DANS LES FILMS D'OXYDES ANODIQUES SUR ALLANFORD WA; ALWITT RS; DYER CK et al.1980; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1980; VOL. 127; NO 2; PP. 405-411; BIBL. 24 REF.Article
SIMS EVIDENCE CONCERNING WATER IN PASSIVE LAYERS = MISE EN EVIDENCE PAR SPECTROMETRIE SIMS D'EAU DANS LES COUCHES PASSIVESMURPHY OJ; BOCKRIS JOM; POU TE et al.1982; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1982; VOL. 129; NO 9; PP. 2149-2151; BIBL. 20 REF.Article
A STUDY OF THE INITIAL OXIDATION OF CHROMIUM-NICKEL STEEL BY SIMSBLASEK G; WEIHERT M.1979; SURF. SCI.; NLD; DA. 1979; VOL. 82; NO 1; PP. 215-227; BIBL. 25 REF.Article
ESCA AND SIMS STUDIES OF THE PASSIVE FILM ON IRON = ETUDE PAR ESCA ET SIMS DU FILM PASSIF SUR FETJONG SC; YEAGER E.1981; J. ELECTROCHEM. SOC.; ISSN 0013-4651; USA; DA. 1981; VOL. 128; NO 10; PP. 2251-2254; BIBL. 7 REF.Article
APPLICATION OF SIMS TO ANALYSIS OF STEELSTSUNOYAMA K; SUZUKI T; OHASHI Y et al.1980; MASS SPECTROSC.; JPN; DA. 1980; VOL. 28; NO 1; PP. 1-8; BIBL. 34 REF.Article
UNTERSUCHUNGEN ZUR SELEKTIVEN OXIDATION VON GOLD-KUPFER-CADMIUM-LEGIERUNGEN MIT EINEM SEKUNDAERIONENMASSENSPEKTROMETER = RECHERCHES SUR L'OXYDATION SELECTIVE DES ALLIAGES AU-CU-CD A L'AIDE D'UN SPECTROMETRE DE MASSE SECONDAIREBECKER S; BLANK P; FELLER HG et al.1979; METALL; DEU; DA. 1979; VOL. 33; NO 7; PP. 751-757; ABS. ENG; BIBL. 18 REF.Article
POROUS ANODIC FILMS FORMED ON ALUMINIUM IN CHROMIC ACID = FILMS D'ANODISATION POREUX FORMES SUR AL DANS L'ACIDE CHROMIQUETHOMPSON GE; WOOD GC; HUTCHINGS R et al.1980; TRANS. INST. MET. FINISH.; ISSN 0020-2967; GBR; DA. 1980; VOL. 58; NO 1; PP. 21-25; BIBL. 14 REF.Article
BUTTLE FRACTURE ANALYSIS OF MO BY SIMSKITAJIMA M; NODA T; OKADA M et al.1981; NIPPON KINZOKU GAKKAISHI (1952); ISSN 0021-4876; JPN; DA. 1981; VOL. 45; NO 2; PP. 219-220; BIBL. 5 REF.Article
Introduction to the Cameca SIMS instrumentsSCHUHMACHER, M.Le Vide (1995). 1999, Vol 54, Num 292, issn 1266-0167, 139, 231-244 [15 p.]Article
Shave-off depth profiling for nano-devicesNOJIMA, Masashi; TOI, Masayuki; MAEKAWA, Ayaka et al.Mikrochimica acta (1966. Print). 2006, Vol 155, Num 1-2, pp 219-223, issn 0026-3672, 5 p.Conference Paper
Sputtered neutral mass spectrometryREUTER, W.TrAC. Trends in analytical chemistry (Regular ed.). 1989, Vol 8, Num 6, pp 203-208, issn 0165-9936Article
Static SIMS investigation of Ag-supported amino acidsTAMAKI, S; SICHTERMANN, W; BENNINGHOVEN, A et al.Japanese journal of applied physics. 1984, Vol 23, Num 5, pp 544-549, issn 0021-4922, 1Article
Detection of gaseous organophosphorus compounds using secondary ion mass spectrometryGROENEWOLD, G. S; TODD, P. J.Analytical chemistry (Washington, DC). 1985, Vol 57, Num 4, pp 886-890, issn 0003-2700Article
Secondary ion mass spectrometer design considerations for organic and inorganic analysisMAGEE, C. W.A.C.S. symposium series. 1985, Num 291, pp 97-112, issn 0097-6156Article
The effect of oxygen flooding on the secondary ion yield of Cs in the cameca IMS 3fSYKES, D. E; CHEW, A; CRAPPER, M. D et al.Vacuum. 1992, Vol 43, Num 1-2, pp 159-162, issn 0042-207XConference Paper
Sources of uncertainty in the experimental determination of sample heterogeneity in secondary ion mass spectrometryMICHIELS, F. P. L; ADAMS, F. C. V.Analytical chemistry (Washington, DC). 1991, Vol 63, Num 23, pp 2735-2743, issn 0003-2700Article
Isotopic studies of oxidation of Si3N4 and Si using SIMSHONGHUA DU; HOUSER, C. A; TRESSLER, R. E et al.Journal of the Electrochemical Society. 1990, Vol 137, Num 2, pp 741-742, issn 0013-4651, 2 p.Article
Relative sensitivity factors of elements in quantitative secondary ion mass spectrometric analysis of biological reference materialsRAMSEYER, G. O; MORRISON, G. H.Analytical chemistry (Washington, DC). 1983, Vol 55, Num 12, pp 1963-1970, issn 0003-2700Article
Sulfur Isotope Studies in Solid Organics: A Protocol for Utilizing Heterogeneous Standards and Secondary Ion Mass SpectrometryKING, Hubert E; ZIMMER, Mindy M; HORN, William C et al.Energy & fuels. 2014, Vol 28, Num 3-4, pp 2446-2453, issn 0887-0624, 8 p.Article
Secondary electron analysis of polymeric sions generated by an electrospray ion sourceXU, Y; BAE, Y. K; BEUHLER, R. J et al.Journal of physical chemistry (1952). 1993, Vol 97, Num 46, pp 11883-11886, issn 0022-3654Article
ION BEAM-TARGET INTERACTIONS IN ION MICROPROBE ANALYSISUNILSON GC.1982; INT. J. MASS SPECTROM. ION PHYS.; ISSN 0020-7381; NLD; DA. 1982; VOL. 42; NO 1-2; PP. 51-61; BIBL. 45 REF.Article
ANALYZA POVRCHU ODLITKU Z TAVENEHO CEDICE METODOU SIMS = ANALYSE DE SURFACE DE PRODUITS EN BASALTE FONDU, PAR LA METHODE SIMSHEDBAVNY P; RYCHLY R.1982; SILIKATY; ISSN 0037-5241; CSK; DA. 1982; VOL. 26; NO 1; PP. 63-68; ABS. RUS/ENG; BIBL. 10 REF.Article
UNTERSUCHUNG VON HETEROGEN-KATALYSATOREN MIT MODERNEN OBERFLAECHEN-ANALYSENMETHODEN = STUDY OF HETEROGENEOUS CATALYSTS BY MODERN SURFACE ANALYSIS METHODSMROSS WD; KRONENBITTER J.1982; CHEM.-ING.-TECH.; DEU; DA. 1982-01; VOL. 54; NO 1; PP. 33-40; BIBL. 42 REF.Conference Paper
QUANTITATIVE SURFACE ANALYSIS OF COPPER-NICKEL ALLOYS BY SECONDARY ION MASS SPECTROMETRY = ANALYSE QUANTITATIVE DE SURFACE DES ALLIAGES CUIVRE-NICKEL PAR SPECTROMETRIE DE MASSE D'ION SECONDAIREFUKUDA Y; HONDA F; RABALAIS JW et al.1980; ANAL. CHEM. (WASH.); ISSN 0003-2700; USA; DA. 1980; VOL. 52; NO 13; PP. 2213-2214; BIBL. 19 REF.Article
THE RESIN BEAD AS A THERMAL ION SOURCE: A SIMS STUDYSMITH DH; CHRISTIE WH; EBY RE et al.1980; INT. J. MASS SPECTROM. ION PHYS.; ISSN 0020-7381; NLD; DA. 1980; VOL. 36; NO 3; PP. 301-316; BIBL. 22 REF.Article